Versum Materials CopperReady® CP72B Advanced Post-CMP Cleaning Solution & Pad Cleaner (Case of 4 x 1-Gallons)
Please see the TECHNICAL DATASHEET for CopperReady® CP72B Advanced Post-CMP Cleaning Solution & Pad Cleaner located in the "Documents" sub-tab below.
- High performance, post-CMP cleaning solution engineered specifically to remove trace metals, organics and particle contaminants.
- Proven to be an excellent Post CMP cleaner in other CMP processes.
- Also ideally suited for use as a Pad Cleaner and in STI and other FEOL polishes.
- For use in both alkaline and acidic barrier slurries
- Substantial removal of Cu-BTA complexes and other organic residues.
- Case of 4 x 1-Gallons (Cases Only)
- Manufacturer Part No: CP72B
PLEASE NOTE: Product images and descriptions may not exactly represent the product. Prior to making your purchase, please confirm that the manufacturer part number shown above matches the product you seek. Returns are not allowed for such differences if the correct manufacturer part number is shipped.
Details
CoppeReady® CP72B Advanced Post-Cu CMP Cleaning Solution by Versum Materials is an acidic, non‐fluorinated, high performance, post‐CMP cleaning solution. CoppeReady® CP72B was engineered specifically to remove trace metals, organics and particle contaminants from copper, tantalum/tantalum nitride and hydrophobic Low‐K surfaces. This product can also be used for pad cleaning to extend pad life by two to three times.
CoppeReady® CP72B advanced cleaning solution has been proven as an excellent post‐CMP cleaner for use in other CMP processes, such as those required for Al Hi‐K Metal Gate integration schemes, STI and other FEOL polishes, oxide, and tungsten brush box and pad cleans.
Versum Materials® provides technically advanced materials that reduce cost‐of‐ownership because they are highly‐concentrated (enabling high dilutions). They have developed optimized, proven processes to enable short chemistry dispense times and eliminate the need to use chemistry in a megasonic tank
CoppeReady® CP72B advanced cleaning solution has been proven as an excellent post‐CMP cleaner for use in other CMP processes, such as those required for Al Hi‐K Metal Gate integration schemes, STI and other FEOL polishes, oxide, and tungsten brush box and pad cleans.
Versum Materials® provides technically advanced materials that reduce cost‐of‐ownership because they are highly‐concentrated (enabling high dilutions). They have developed optimized, proven processes to enable short chemistry dispense times and eliminate the need to use chemistry in a megasonic tank
Documents & Videos
CoppeReady® CP72B Advanced Post-Cu CMP Cleaning Solution by Versum Materials is an acidic, non‐fluorinated, high performance, post‐CMP cleaning solution. CoppeReady® CP72B was engineered specifically to remove trace metals, organics and particle contaminants from copper, tantalum/tantalum nitride and hydrophobic Low‐K surfaces. This product can also be used for pad cleaning to extend pad life by two to three times.
CoppeReady® CP72B advanced cleaning solution has been proven as an excellent post‐CMP cleaner for use in other CMP processes, such as those required for Al Hi‐K Metal Gate integration schemes, STI and other FEOL polishes, oxide, and tungsten brush box and pad cleans.
Versum Materials® provides technically advanced materials that reduce cost‐of‐ownership because they are highly‐concentrated (enabling high dilutions). They have developed optimized, proven processes to enable short chemistry dispense times and eliminate the need to use chemistry in a megasonic tank
CoppeReady® CP72B advanced cleaning solution has been proven as an excellent post‐CMP cleaner for use in other CMP processes, such as those required for Al Hi‐K Metal Gate integration schemes, STI and other FEOL polishes, oxide, and tungsten brush box and pad cleans.
Versum Materials® provides technically advanced materials that reduce cost‐of‐ownership because they are highly‐concentrated (enabling high dilutions). They have developed optimized, proven processes to enable short chemistry dispense times and eliminate the need to use chemistry in a megasonic tank