FUJIFILM Electronic Materials 882520 Aluminum Etch 16:1:1:2 With Surfactant (Case of 4 x 4L)
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- Immersion etchants for aluminum metallization layers
- Etch rates of aluminum films are mostly affected by etch composition and temperature
- Usually a temperature ranging from 35°C and 45°C is selected such that thin films (0.8-2.0µ) etch clear in 2 to 5 minutes
- Case of 4 x 4L Bottles
- Manufacturer Part No: 882520
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Aluminum Etch is an etchant used in semiconductor manufacturing
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Aluminum Etch is an etchant used in semiconductor manufacturing