JT Baker® 2200-09 Hydrogen Peroxide, 30%, CMOS Electronic Grade, 500-Lb Poly Drum
- Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
- Appearance : Colorless liquid
- Trace Impurity Level: 200 to 10ppb
- pH : 3.3
- 500 Lb Poly Drum
- Manufacturer Part No: JT-2200-09
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