JT Baker® 9529-15 Hydrochloric Acid, 36.5-38.0%, CMOS Electronic Grade, 520Lb Poly Drum
- In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
- CMOS™ Grade
- Trace Impurity Level: 200 to 10ppb
- SEMI Grade: 1
- 520Lb Poly Drum
- Manufacturer Part No: JT-9529-15
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In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
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In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.