KMG Electronic Chemicals 064010 Hydrochloric Acid 37%, Cleanroom LP Grade, 55-Gallon Drum
- In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides.
- Assay (HCl): 37.0 to 38.0%
- Color (APHA): 10
- 0.5μ Particle Count: 150 Par/mL; 1.0μ Particle Count: 25 Par/mL
- Trace impurities measured in PPM. See "Documents" sub-tab below for "Product Datasheet" link.
- 55-Gallon Poly Drum (Net Fill Weight: 507-Lbs / 230Kg)
- Manufacturer Part No: 64010
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Details
In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides. Cleanroom LP Grade. 55-Gallon Poly Drum. KMG Item #: 064010.
Documents & Videos
In semiconductor processing, the presence of metallic impurities on the wafer can lead to early dielectric breakdown. Hydrochloric acid is a key ingredient to remove surface metallic ions by forming soluble metal chlorides. Cleanroom LP Grade. 55-Gallon Poly Drum. KMG Item #: 064010.