KMG Electronic Chemicals 64022 Hydrogen Peroxide 30%, Cleanroom LP Grade, 1 Gallon Bottle (Case of 4)
- Assay (H2O2): 30.0 to 32.0%
- Free Acid: 0.5000 ueq/g
- 0.2μ Particle Count: 1000 Par/mL; 0.5μ Particle Count: 100 Par/mL; 1.0μ Particle Count: 10 Par/mL
- Trace impurities measured in PPM. See "Documents" sub-tab below for "Product Datasheet" link.
- Case of 4 x 1 Gallon Bottles
- Manufacturer Part No: 64022
PLEASE NOTE: Product images and descriptions may not exactly represent the product. Prior to making your purchase, please confirm that the manufacturer part number shown above matches the product you seek. Returns are not allowed for such differences if the correct manufacturer part number is shipped.
Details
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
Documents & Videos
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.