KMG Electronic Chemicals 064027 Hydrogen Peroxide 30%, Cleanroom MegaBit Grade, 55 Gallon Poly Drum
- Assay (H202): 30.0 to 32.0%. Color (APHA): 6
- Trace impurities measured in PPB. See "Documents" sub-tab below for "Product Datasheet" link.
- 0.5 Micron Particle Count: <150 Par/mL; 1.0 Micron Particle Count: <25 Par/mL
- Free Acid: <60 MICROEQG
- 55 Gallon Poly Drum. Fill Weight: 225Kg (496-Lbs)
- Manufacturer Part No: 64027
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Details
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
Documents & Videos
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.