KemLab™ KL IR-15-LO-100ML Image Reversal Negative Lift Off Photoresist, 1.2 to 2.6um Film Thickness, 100mL Bottle (SAMPLE)

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  • Designed for use with industry standard 0.26 N TMAH developers
  • Film Thickness Range: 1.2 to 2.6 microns
  • Removal: NMP/DMSO based strippers
  • Positive or Negative Resist Mode - Softbake: 105°C for 90 seconds
  • Image Reversible Photoresist with Negative Lift-Off Profile. Expose: Broadband, i-line, g-line.
  • 100mL SAMPLE Bottle
  • Manufacturer Part No: KLIR15LIFTOFF-100ML
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Item Number: KEM-KL-IR-15-LIFTOFF-100ML

Details

KemLab™ KL IR Lift-Off 15 Photoresist is a Dual-Tone photoresist designed for i-line, g-line, and broadband exposure. It is designed for optimal lift-off process profiles when used as a negative photoresist.

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KemLab™ KL IR Lift-Off 15 Photoresist is a Dual-Tone photoresist designed for i-line, g-line, and broadband exposure. It is designed for optimal lift-off process profiles when used as a negative photoresist.

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