KemLab™ KL IR-15-LO-100ML Image Reversal Negative Lift Off Photoresist, 1.2 to 2.6um Film Thickness, 100mL Bottle (SAMPLE)
- Designed for use with industry standard 0.26 N TMAH developers
- Film Thickness Range: 1.2 to 2.6 microns
- Removal: NMP/DMSO based strippers
- Positive or Negative Resist Mode - Softbake: 105°C for 90 seconds
- Image Reversible Photoresist with Negative Lift-Off Profile. Expose: Broadband, i-line, g-line.
- 100mL SAMPLE Bottle
- Manufacturer Part No: KLIR15LIFTOFF-100ML
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Details
KemLab™ KL IR Lift-Off 15 Photoresist is a Dual-Tone photoresist designed for i-line, g-line, and broadband exposure. It is designed for optimal lift-off process profiles when used as a negative photoresist.
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KemLab™ KL IR Lift-Off 15 Photoresist is a Dual-Tone photoresist designed for i-line, g-line, and broadband exposure. It is designed for optimal lift-off process profiles when used as a negative photoresist.