MICROPOSIT™ MF™ CD-26 Developer is a 0.26N Surfactant Free product that offers high Photospeed and improved processing latitude for Conventional and Advanced Photoresists. MF™ CD-26 is effective across various resist technologies including g/h/i line, KrF and ArF. MF CD-26 is a TMAH based Developer designed to be Metal Ion Free to avoid potential sources of Metal Ion Contamination. MF™ CD-26 works well in Spray, Spray-Puddle, and Immersion processes.
MICROPOSIT™ MF™ 312 and 314 are metal-ion-free surfactant-containing developers designed to provide high throughput and wide processing latitude for g-Line applications in a variety of processes. They have been optimized for wafer fabrication and other microelectronic applications for which high speed and resolution are required.
MICROPOSIT™ 303A Developer is an aqueous alkaline solution. It is suitable for all general microelectronic applications.
MICROPOSIT™ 351, 352, and 452 Developers are aqueous alkaline solutions for commercially available positive resists such as 1300 and specifically formulated for use with MICROPOSIT S1400™ and S1800™ Series Photoresist systems. They have been optimized for wafer fabrication and other microelectronic applications for which high-speed and resolution are required.