AR™ 10L-600 DUV Anti-Reflectant is an organic, thermally cross-linking bottom anti-reflectant for 248nm (KrF) photoresists. It is designed to provide a universal anti-reflective surface for high- and low-temperature resist platforms and offers excellent compatibility with most ESCAP, HYBRID, and Acetal resists. AR™ 10L is a conformal 1st min. 248nm anti-reflectant and is typically used in the range of 400-1200A over transparent thin films on reflective substrates. Due to the wide range of resist compatibility that AR™ 10L offers, it is an ideal candidate for a consolidation BARC product.