JT Baker® 2200-07 Hydrogen Peroxide, 30%, CMOS Electronic Grade, 19L Poly Pail
- Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
- CMOS™ Grade
- Trace Impurity Level: 200 to 10ppb
- SEMI Grade: 1
- 19L Poly Pail
- Manufacturer Part No: JT-2200-07
PLEASE NOTE: Product images and descriptions may not exactly represent the product. Prior to making your purchase, please confirm that the manufacturer part number shown above matches the product you seek. Returns are not allowed for such differences if the correct manufacturer part number is shipped.
Details
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
Documents & Videos
Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.