Welcome to our NEW WEBSITE! You may experience lags in "Search" results, webpage transition or other problems. Please be patient while we resolve issues and call us at (800) 580-1167 if you need assistance.
Ammonium hydroxide is used in a SC-1 solution to remove organics and particles from the surface of a wafer. The ammonium hydroxide allows undercutting of the silicon dioxide, freeing particles from the wafer by lift-off.