JT Baker® 5369-03 Hydrogen Peroxide, 30%, VLSI Electronic Grade (Case of 4)
- Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
- Finyte electronic grade
- Trace Impurity Level: 10ppb
- SEMI Grade: 2, SEMI Tier: A
- 4 x 8-Pint Poly Bottles/Case (Cases Only)
- Manufacturer Part No: JT-5369-03
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Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
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Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.