JT Baker® 5516-07 Hydrogen Peroxide, 30%, Finyte Electronic Grade, 19L Poly Pail

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  • Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.
  • Finyte electronic grade
  • Trace Impurity Level: 10ppb
  • SEMI Grade: 2, SEMI Tier: A
  • 19L Poly Pail
  • Manufacturer Part No: JT-5516-07
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Item Number: JTB-5516-07
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Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.

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Hydrogen peroxide is used in SC-1 and SC-2 solutions to remove particles from silicon wafers and to remove surface metallic contamination. The purity of the hydrogen peroxide is critical to surface roughness and metallic residual levels on the wafer.

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