This Baker Aleg-380 photresist stripper and residue remover by Avantor
Performance Materials® provides effective cleaning of bulk photoresists,
heavily cross-linked ash/etch residues, and sidewall polymers. It is
very effective on ash residues that are high in titanium content. Its
versatility allows one chemistry to be used in traditional semiconductor
processes containing aluminum/silicone dioxide layers. Baker Aleg-380
stripper and residue remover can also be used in back end packaging
applications (flip chips/bumps). It provides efficient etch/ash residue
removal with results in 5 to 20 minutes. It is designed to provide
protection against galvanic corrosion associated with device
architecture containing complicated metal stacks. The 100% water soluble
formulation means no intermediate solvent rinse is required, resulting
in decreased total process time and costs. It is designed to provide
broad process lattitude in terms of processing time and temperature.
Typical bath life is greater than 24 hours. It does not contain fluoride
or hydroxylamine. Baker Aleg-380 appears as a clear light orange liquid
with an amine-like odor. Packaged as a 4 liter container with 4
containers per case. Material: Baker Aleg-380 (Ethanolamine).
Appearance: Clear Liquid. Color: Light Orange. Odor: Amine-like. pH:
10.4 (5% Solution). Boiling Point: 240.8°F (116°C). Flash Point: Less
Than 230°F (110°C) Closed Cup. Specific Gravity: 1.06. Solubility:
Soluble. 19-Liter Poly Pail. Avantor Performance
Materials® #: 6485-07.