Some processes require chromium etchants with a surfactant. The surfactant is intended to improve the wetting characteristic of the product for <1μ geometries, resulting in optimum etch uniformity. If you need this type of product, we can accommodate your process requirement.
The reported etch rates are performed on photomask blanks at 21°C, coated with 980 A of anti-reflective chrome. Etch rates are not absolute values. They may vary with chrome type, deposition method, chrome blank supplier, process equipment utilized and type of agitation. KMG Electronic Chemicals®