KemLab™ 1000 HARP™1.5-CS PMMA e-Beam Positive Photoresist, 1.7um Film Thickness (Case of 4 x 4L Bottles)

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  • Photoresist Tone: Positive
  • ~Film Thickness: 1.7 microns at 2000rpm; ~Viscosity (cst): 282.
  • Applications: e-Beam Direct Write Lithography, T-Gate Manufacture, X-Ray LIGA, Wafer Thinning
  • Highest Mw (molecular weight) PMMA Polymer; Manufactured in Anisole. Best resolution & contrast PMMA.
  • Competes with 950 PMMA A9 Photoresist.
  • Case of 4 x 4L Bottles
  • Manufacturer Part No: 1000HARPeB1.7-CS
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Item Number: KEM-1000HARPeB1.7-CS

Details

KemLab™ 1000 HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP™ multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. KemLab™ HARP™ 1000 PMMA e-Beam positive photoresist is manufactured with Anisole.

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KemLab™ 1000 HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP™ multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. KemLab™ HARP™ 1000 PMMA e-Beam positive photoresist is manufactured with Anisole.

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