KemLab™ 500 HARP™0.4-500ML PMMA e-Beam Positive Photoresist, 0.4um Film Thickness, 500mL Bottle
- Photoresist Tone: Positive
- ~Film Thickness: 0.4 microns at 2000rpm; ~Viscosity (cst): 32.
- Applications: e-Beam Direct Write Lithography, T-Gate Manufacture, X-Ray LIGA, Wafer Thinning
- PMMA Polymer with Mid-Range Mw; Faster throughput vs 1000 HARP e-Beam; Manufactured in Anisole.
- Competes with 495 PMMA A6 Photoresist.
- 500mL Bottle
- Manufacturer Part No: 500HARPeB0.4-500ML
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Details
KemLab™ 500 HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP™ multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. KemLab™ HARP™ 500 PMMA e-Beam positive photoresist is manufactured with Anisole.
Documents & Videos
KemLab™ 500 HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP™ multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. KemLab™ HARP™ 500 PMMA e-Beam positive photoresist is manufactured with Anisole.