KemLab™ 500 HARP™1.5-500ML PMMA e-Beam Positive Photoresist, 1.5um Film Thickness, 500mL Bottle

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  • Photoresist Tone: Positive
  • ~Film Thickness: 1,5 microns at 2000rpm; ~Viscosity (cst): 109.
  • Applications: e-Beam Direct Write Lithography, T-Gate Manufacture, X-Ray LIGA, Wafer Thinning
  • PMMA Polymer with Mid-Range Mw; Faster throughput vs 1000 HARP e-Beam; Manufactured in Anisole.
  • Competes with 495 PMMA A11 Photoresist.
  • 500mL Bottle
  • Manufacturer Part No: 500HARPeB1.5-500ML
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Item Number: KEM-500HARPeB1.5-500ML

Details

KemLab™ 500 HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP™ multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. KemLab™ HARP™ 500 PMMA e-Beam positive photoresist is manufactured with Anisole.

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KemLab™ 500 HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP™ multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. KemLab™ HARP™ 500 PMMA e-Beam positive photoresist is manufactured with Anisole.

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