KemLab™ KL 5302 High Resolution Positive Thin Photoresist, 0.15 to 0.25um Film Thickness, 1L Bottle

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight
  • Photoresist Tone: Positive
  • Film Thickness: 0.15 to 0.25 microns. Viscosty (cst): ~2.
  • Applicatons: Difraction Grating and Interference Lithography
  • Photoresist can be applied in interference or holographic lithography. Can also be applied in broadband exposure tools and steppers.
  • Competes with Dow®MICROPOSIT™ Positive Photoresists
  • 1L Bottle
  • Manufacturer Part No: KL5302HI-RES-1L
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Item Number: KEM-KL5302-1L

Details

KemLab™ KL 5302 high resolution, positive thin photoresist is designed for film thickness of approximately 200nm. It is applied in interference or holographic lithography. Applied in broadband exposure tools or steppers.

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KemLab™ KL 5302 high resolution, positive thin photoresist is designed for film thickness of approximately 200nm. It is applied in interference or holographic lithography. Applied in broadband exposure tools or steppers.

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