KemLab™ APOL-LO 3204-500ML High Resolution Negative Lift Off Photoresist, 3 to 6um Film Thickness, 500mL Bottle

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  • APOL-LO 3200 Series photoresists are a negative tone advanced photoresist with a lift-off profile for i-Line and broadband applications.
  • Film Thickness Range: 3 to 6 microns. ~Viscosity (cst): 67.
  • Customizations are availble to: (a) Adjust Lift-Off Angle and/or (b) Adjust PhotoSpeed.
  • Improved resolution. Wider Process Latitude.
  • Competes with AZ® nLOF™ 2020 Negative Lift Off Photoresist. Designed for use with industry standard 0.26 N TMAH developers.
  • 500mL Bottle
  • Manufacturer Part No: APOL-LO3204-500ML
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Item Number: KEM-APOL-LO3204-500ML

Details

KemLab™ APOL-LO 3200 Series photoresists are a negative tone advanced photoresist with Lift-Off profile for i-Line, and broadband applications. Photoresist has improved resolution and a wider process window compared to the original negative lift-off KL1600.?? Designed for use with industry standard developers. Custom formulations are available to adjust lift-off angle and the photospeed.

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KemLab™ APOL-LO 3200 Series photoresists are a negative tone advanced photoresist with Lift-Off profile for i-Line, and broadband applications. Photoresist has improved resolution and a wider process window compared to the original negative lift-off KL1600.?? Designed for use with industry standard developers. Custom formulations are available to adjust lift-off angle and the photospeed.

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