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KemLab™ SQ 50-CS SU-8 Epoxy Photoresist, 50um Film Thickness (Case of 4 x 4L Bottles)

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight

Item Number:KEM-HARE-SQ-50-CS

Manufacturer Part No:SQ50-CS

Manufacturer:KemLab

Units:Case of 4 x 4L Bottles

Details

KemLab™ SQ SU-8 epoxy photoresist uses an epoxy resin with superior cleanliness and excellent reproducibility

Film Thickness: 50 microns. Consistent surface energy of crosslinked resist, (an important property for microfluidic applications.

Fully compatible with SU-8 processes. KemLab™ SQ SU-8 epoxy photoresist is designed for use with KemLab™ SQ developer

Softbake for the KemLab™ SQ SU-8 expoxy photoresist utilizes a two-step bake on a contact hot plate in order to minimize film stress and adhesion issues

Competes with SU8 50 Negative Tone Photoresist

Case of 4 x 4L Bottles

KemLab™ SQ is an epoxy based photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.

Documents & Videos

KemLab™ SQ is an epoxy based photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.