KemLab™ HARP™ DEV1-1-4L PMMA Photoresist Developer, 1:1 MIBK:IPA, 4L Bottle
- KemLab™ HARP™ PMMA photoresist developer with a 1:1 ratio of MIBK and IPA.
- High resolution / Fast Develop
- Designed for use with KemLab™ HARP™ PMMA and Copolymer e-Beam Positive Photoresists
- Immersion, Puddle and Spray development techniques recommended.
- Example Development Process: (1) 60-sec immersion in MIBK/IPA (2) 30-sec rinse with IPA (3) Spin dry or N2 blow dry.
- 4L Bottle
- Manufacturer Part No: MIBK/IPA1-DEVEL-4L
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