KemLab™ SQ 2-100ML SU-8 Epoxy Photoresist, 2um Film Thickness, 100mL Bottle (SAMPLE)

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight
Item Number:KEM-HARE-SQ-2-100ML
Manufacturer Part No:SQ2-100ML
Manufacturer:KemLab
Units:100mL SAMPLE Bottle

Details

  • KemLab™ SQ SU-8 epoxy photoresist uses an epoxy resin with superior cleanliness and excellent reproducibility
  • Film Thickness: 2 microns. Consistent surface energy of crosslinked resist, (an important property for microfluidic applications.
  • Fully compatible with SU-8 processes. KemLab™ SQ SU-8 epoxy photoresist is designed for use with KemLab™ SQ developer
  • Softbake for the KemLab™ SQ SU-8 expoxy photoresist utilizes a two-step bake on a contact hot plate in order to minimize film stress and adhesion issues
  • Competes with SU8 2 Negative Tone Photoresist
  • 100mL SAMPLE Bottle
KemLab™ SQ is an epoxy based photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.

Documents & Videos

KemLab™ SQ is an epoxy based photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.