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KemLab™ HARE-SQ™ 2-100ML Negative High Aspect Ratio Epoxy Photoresist, 2um Film Thickness, 100mL Bottle (SAMPLE)

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight

Item Number:KEM-HARE-SQ-2-100ML

Manufacturer Part No:HARESQ2-100ML

Manufacturer:KemLab

Units:100mL SAMPLE Bottle

Details

KemLab™ HARE-SQ™ negative tone photoresist uses an epoxy resin with superior cleanliness and excellent reproducibility

Film Thickness: 2 microns. Consistent surface energy of crosslinked resist, (an important property for microfluidic applications.

Fully compatible with SU-8 processes. KemLab™ HARE-SQ™ negative tone epoxy photoresist is designed for use with KemLab™ SQ developer.

Softbake for the KemLab™ HARE-SQ™ negative tone photoresist utilizes a two-step bake on a contact hot plate in order to minimize film stress and adhesion issues.

Competes with SU8 2 Negative Tone Photoresist

100mL SAMPLE Bottle

KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.

Documents & Videos

KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.