KemLab™ HARE-SQ™ 2-100ML Negative High Aspect Ratio Epoxy Photoresist, 2um Film Thickness, 100mL Bottle (SAMPLE)

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight
  • KemLab™ HARE-SQ™ negative tone photoresist uses an epoxy resin with superior cleanliness and excellent reproducibility
  • Film Thickness: 2 microns. Consistent surface energy of crosslinked resist, (an important property for microfluidic applications.
  • Fully compatible with SU-8 processes. KemLab™ HARE-SQ™ negative tone epoxy photoresist is designed for use with KemLab™ SQ developer.
  • Softbake for the KemLab™ HARE-SQ™ negative tone photoresist utilizes a two-step bake on a contact hot plate in order to minimize film stress and adhesion issues.
  • Competes with SU8 2 Negative Tone Photoresist
  • 100mL SAMPLE Bottle
  • Manufacturer: KemLab Inc
  • Manufacturer Part No: HARE-SQ-2-100ML
(0) No Reviews yet
Item Number: KEM-HARE-SQ-2-100ML

Details

KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.

Documents & Videos

KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.

Ratings & Reviews

No reviews available

Be the first to Write a Review