KemLab™ HARE-SQ™ 25-100ML Negative High Aspect Ratio Epoxy Photoresist, 25um Film Thickness, 100mL

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Item Number: KEM-HARE-SQ-25-100ML



KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.

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