KemLab™ HARE-SQ™ 5-1L Negative High Aspect Ratio Epoxy Photoresist, 5um Film Thickness, 1L Bottle

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Item Number:KEM-HARE-SQ-5-1L
Manufacturer Part No:HARESQ5-1L
Manufacturer:KemLab
Units:1L Bottle

Details

  • KemLab™ HARE-SQ™ negative tone photoresist uses an epoxy resin with superior cleanliness and excellent reproducibility
  • Film Thickness: 5 microns. Consistent surface energy of crosslinked resist, (an important property for microfluidic applications.
  • Fully compatible with SU-8 processes. KemLab™ HARE-SQ™ negative tone epoxy photoresist is designed for use with KemLab™ SQ developer.
  • Softbake for the KemLab™ HARE-SQ™ negative tone photoresist utilizes a two-step bake on a contact hot plate in order to minimize film stress and adhesion issues.
  • Competes with SU8 5 Negative Tone Photoresist
  • 1L Bottle
KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.

Documents & Videos

KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.