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KemLab™ KL1602 Negative Lift Off Photoresist, 2 to 4um Film Thickness, 1L Bottle

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight

Item Number:KEM-KL1602-1L

Manufacturer Part No:KL1602-1L

Manufacturer:KemLab

Units:1L Bottle

Details

Designed for use with industry standard developers

Film Thickness Range: 2 to 4 microns. ~Viscosity (cst): 25. Improved resolution. Wider Process Latitude.

Wide process window for consistency across substrates, while still retaining ability to adjust resist profile

Soft-bake on contact hotplate: 110°C for 60 seconds

KL1602 is suitable for i-Line and broadband exposure

1L Bottle

KemLab™ KL 1602 Lift Off Photoresist is a negative photoresist with Lift-Off profile for i-Line, and broadband applications. It has a wide process window for consistency across substrates, while still retaining ability to adjust resist profile. Customization is available to adjust lift-off angle or adjust photo speed.

Documents & Videos

KemLab™ KL 1602 Lift Off Photoresist is a negative photoresist with Lift-Off profile for i-Line, and broadband applications. It has a wide process window for consistency across substrates, while still retaining ability to adjust resist profile. Customization is available to adjust lift-off angle or adjust photo speed.