KemLab™ KL 5302 High Resolution Positive Thin Photoresist, 0.15 to 0.25um Film Thickness, 50mL Bottle (SAMPLE)
- Photoresist Tone: Positive
- Film Thickness: 0.15 to 0.25 microns. Viscosty (cst): ~2.
- Applicatons: Difraction Grating and Interference Lithography
- Photoresist can be applied in interference or holographic lithography. Can also be applied in broadband exposure tools and steppers.
- Competes with Dow®MICROPOSIT™ Positive Photoresists
- 50mL Sample Bottle
- Manufacturer Part No: KL5302-50ML
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Details
KemLab™ KL 5302 high resolution, positive thin photoresist is designed for film thickness of approximately 200nm. It is applied in interference or holographic lithography. Applied in broadband exposure tools or steppers.
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KemLab™ KL 5302 high resolution, positive thin photoresist is designed for film thickness of approximately 200nm. It is applied in interference or holographic lithography. Applied in broadband exposure tools or steppers.