KemLab® Inc KL6008-4L Postive Photoresist, 4L

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight
  • Designed for use with industry standard 0.26 N TMAH developers
  • Film Thickness range of 5 - 12µm
  • Suitable for i-Line, broadband or gLine exposure.
  • Soft-bake: 105°C for 150 seconds
  • No PEB necessary
  • 4 Liters
  • Manufacturer: KemLab Inc
  • Manufacturer Part No: KL6008-4L
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Item Number: KEM-KL6008-4L

Details

KL6004 is a positive photoresist for use in i-Line, g-Line and broadband applications. KL6004 offers high sensitivity, high throughput, and excellent process latitude.

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KL6004 is a positive photoresist for use in i-Line, g-Line and broadband applications. KL6004 offers high sensitivity, high throughput, and excellent process latitude.

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