KemLab® Inc KL6008-4L Postive Photoresist, 4L
Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight
- Designed for use with industry standard 0.26 N TMAH developers
- Film Thickness range of 5 - 12µm
- Suitable for i-Line, broadband or gLine exposure.
- Soft-bake: 105°C for 150 seconds
- No PEB necessary
- 4 Liters
- Manufacturer: KemLab Inc
- Manufacturer Part No: KL6008-4L
Details
KL6004 is a positive photoresist for use in i-Line, g-Line and broadband applications. KL6004 offers high sensitivity, high throughput, and excellent process latitude.
Documents & Videos
KL6004 is a positive photoresist for use in i-Line, g-Line and broadband applications. KL6004 offers high sensitivity, high throughput, and excellent process latitude.