KemLab™ KL 5305-CS General Purpose Positive Thin Photoresist, 0.5 to 1um Film Thickness (Case of 4 x 4L Bottles)
- Photoresist Tone: Positive
- Film Thickness: 0.5 to 1 microns. Viscosity (cst): ~5.
- Applicatons: IC Fabrication. Also used in i-Line, g-Line and broadband applications.
- Designed for use with industry standard 0.26 N TMAH developers. Resolution of 0.55um can be achieved.
- Competes with Dow®MICROPOSIT™ S1805™ G2 Positive Photoresist
- Case of 4 x 4L Bottles
- Manufacturer Part No: KL5305-CS
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Details
KemLab™ 5300 series positive photoresists are designed for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude. They are designed for use with industry standard 0.26 N TMAH developers. Resolution of 0.55 µm can be achieved. Custom formulations are available.
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KemLab™ 5300 series positive photoresists are designed for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude. They are designed for use with industry standard 0.26 N TMAH developers. Resolution of 0.55 µm can be achieved. Custom formulations are available.