KemLab™ KL 6005-1L General Purpose Positive Thick Photoresist, 4 to 7um Film Thickness, 1L Bottle
- Designed for use with industry standard 0.26 N TMAH developers
- Film Thickness: 4 to 7 microns
- Suitable for i-Line, broadband or g-Line exposure.
- Soft-Bake (5um): 105°C for 120 seconds
- Competes with Dow® MEGAPOSIT™ SPR220-4.5™ Series i-Line Photoresist
- 1L Bottle
- Manufacturer Part No: KL6005-1L
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Details
KemLab™ KL 6005 is a positive photoresist for use in i-Line, g-Line and broadband applications. KL 6003 offers high sensitivity, high throughput, and excellent process latitude.
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KemLab™ KL 6005 is a positive photoresist for use in i-Line, g-Line and broadband applications. KL 6003 offers high sensitivity, high throughput, and excellent process latitude.