KemLab™ 1000 HARP™ PMMA e-Beam Photoresists
KemLab™ 1000 HARP™ PMMA (polymethyl methacrylate) e-Beam resist is designed for high resolution direct write e-Beam lithography. When combined with HARP-C™ copolymer, the HARP™ multi-layer system is ideal for T-gate manufacture. HARP™ PMMA has excellent adhesion to a wide variety of substrates, and is used as a protective coating layer for wafer thinning and sacrificial layers. KemLab™ HARP™ 1000 PMMA e-Beam positive photoresist is manufactured with Anisole. Applications: • e-Beam direct write lithography • Multi-layer T-gate manufacture • X-Ray LIGA • Protective Coating for wafer thinning.