By continuing to browse the site, you are agreeing to our use of cookies
Strictly Necessary
By continuing to browse the site, you are agreeing to our use of cookies
By continuing to browse the site, you are agreeing to our use of cookies
KemLab™ HARE SQ™ is a negative tone epoxy photoresist designed for polymeric MEMS, microfluidics, micromachining and other permanent microelectronic applications. Sensitive to NUV, i-line and broadband wavelengths. Film thicknesses from 2 to 200 microns.
KemLab™ HARE SQ™ epoxy photoresist also outperforms SU-8 epoxy-based photoresist. This unique photoresist also uses superior epoxies specially designed for the electronics industry, making improvements in optical transparency, particles and filter-ability, cured surface energy consistency, and photoresist lot-to-lot consistency versus industry competitors. The HARE-SQ™ photoresist uses an epoxy resin with superior cleanliness and excellent reproducibility. Consistent surface energy of crosslinked resist (important for microfluidic applications.
KemLab™ HARE SQ™Permanent Appliations Include: MEMS, micro arrays, VSCEL, waveguides, antennas, sensors, microfluidics, PDMS molding, pixel walls, fluidic channels, nozzles and spacers.