Cyantek® KMG 539400 Nano-Strip 2X® Photoresist Stripper (4 x 1-Gallons/Case)

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight
  • Stabilized formulation of sulfuric acid and hydrogen peroxide compounds.
  • Removes positive and nega­tive resists and other organic materials
  • Used in various applica­tions of semiconductor photolithography.
  • Single and stable solution, ready to be used directly out of the container. There is no need to use additional chemicals.
  • Contains high purity reagents required for high yield semiconductor manufacturing.
  • 4 x 1-Gallon/Case
  • Manufacturer: Cyantek
  • Manufacturer Part No: 210037
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Item Number: KMG-539400
$387.47

Sold in: Cases

UnitMSRPYour PriceStock StatusQty
Case459.43387.47In Stock

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Details

Increased stripping capacity and bathlife: Nano-Strip® has a bathlife which may be extended up to a week depending on the nature of the photoresist and the conditions of the process. Batch-to-batch consistency: Nano-Strip® is a single and stable solution, ready to be used directly out of the container. There is no need to use additional chemicals. Since no mixing is required, potential errors and further chemical handling are eliminated. Its performance is consistent and stable. Safe and easy to use: Nano-Strip® strips and cleans organic and inorganic contamination effectively at room temperature or may be used at elevated temperatures to promote more effective stripping. It contains no phenols, chlorinated solvents, and toxic fumes that can endanger operators or damage process equipment. Nano-Strip® can be used in recirculating filtration tanks to prevent particle build-up, promote agitation, resulting in a longer bathlife. High purity: Nano-Strip® is filtered to 0.1 micron. Each bottle is double-bagged. High Purity chemicals are used in its manufacture. This results in lower device defect levels. Low and controlled rate of metal attack: Deterioration of metal surfaces during stripping is negligible compared to other acid stripping formulas. Corrosion of aluminum layers is minimal, and Nano-Strip® leaves no organic residues. Reduced waste: Nano-Strip® has a long extended bath life compared to standard Sulphuric Acid / Hydrogen Peroxide baths. Hazardous acid waste is minimized and the cost of waste treatment is dramatically reduced. Nano-Strip® may reduce chemical volumes and therefore waste by as much as 70%.

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Increased stripping capacity and bathlife: Nano-Strip® has a bathlife which may be extended up to a week depending on the nature of the photoresist and the conditions of the process. Batch-to-batch consistency: Nano-Strip® is a single and stable solution, ready to be used directly out of the container. There is no need to use additional chemicals. Since no mixing is required, potential errors and further chemical handling are eliminated. Its performance is consistent and stable. Safe and easy to use: Nano-Strip® strips and cleans organic and inorganic contamination effectively at room temperature or may be used at elevated temperatures to promote more effective stripping. It contains no phenols, chlorinated solvents, and toxic fumes that can endanger operators or damage process equipment. Nano-Strip® can be used in recirculating filtration tanks to prevent particle build-up, promote agitation, resulting in a longer bathlife. High purity: Nano-Strip® is filtered to 0.1 micron. Each bottle is double-bagged. High Purity chemicals are used in its manufacture. This results in lower device defect levels. Low and controlled rate of metal attack: Deterioration of metal surfaces during stripping is negligible compared to other acid stripping formulas. Corrosion of aluminum layers is minimal, and Nano-Strip® leaves no organic residues. Reduced waste: Nano-Strip® has a long extended bath life compared to standard Sulphuric Acid / Hydrogen Peroxide baths. Hazardous acid waste is minimized and the cost of waste treatment is dramatically reduced. Nano-Strip® may reduce chemical volumes and therefore waste by as much as 70%.

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