KemLab™ KL 6000 Thick Photoresists
KemLab™ KL 6000 series positive photoresists are designed for use in i-Line, g-Line and broadband applications. KL 6000 thick positive photoresist offers high sensitivity, high throughput, and excellent process latitude.
- Cover 2.5 to 12µm in a single coat.
- Designed for use with industry standard TMAH 0.26N developers.
- No PEB necessary.
- Competes with SPR™220-3.0 and S1827™, SPR™220-4.5, SPR™220-7.0, and S1827™