KemLab™ KL 6000 Thick Photoresists

KemLab™ KL 6000 series positive photoresists are designed for use in i-Line, g-Line and broadband applications. KL 6000 thick positive photoresist offers high sensitivity, high throughput, and excellent process latitude.

Key Advantages:

  • Cover 2.5 to 12µm in a single coat.
  • Designed for use with industry standard TMAH 0.26N developers.
  • No PEB necessary.
  • Competes with SPR™220-3.0 and S1827™, SPR™220-4.5, SPR™220-7.0, and S1827™