KemLab™ KL 5300 i-Line, g-Line & Broadband Photoresists

KemLab™ KL 5300 series positive photoresists are designed for use in i-Line, g-Line and broadband applications. They offer high sensitivity, high resolution and excellent process latitude.

Key Advantages of KemLab™ KL 5300 Photoresists::

• Cover 0 to 2.5µm in a single coat.
• Designed for use with industry standard TMAH 0.26 Normal photoresist developers.
• Achieve resolutions of 0.55µm.
• Competes with S1805™, S1808™, S1811™, S1813™, S1818™ photoresists.
• Both custom packaging sizes and production volumes are available upon request.