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KemLab™ HARP™ DEV1-3-4L PMMA Photoresist Developer, 1:3 MIBK:IPA, 4L Bottle

Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight

Item Number:KEM-1-3-HARP-DEV-4L

Manufacturer Part No:MIBK/IPA3-DEVEL-4L

Manufacturer:KemLab

Units:4L Bottle

Unit	MSRP	Your Price	Qty
Each	614.29	518.08

Details

KemLab™ HARP™ PMMA photoresist developer with a 1:3 ratio of MIBK and IPA.

Highest Resolution / Slow Develop

Designed for use with KemLab™ HARP™ PMMA and Copolymer e-Beam Positive Photoresists

Immersion, Puddle and Spray development techniques recommended.

Example Development Process: (1) 60-sec immersion in MIBK/IPA (2) 30-sec rinse with IPA (3) Spin dry or N2 blow dry.

4L Bottle

KemLab™ HARP™ DEV1-3-4L PMMA Photoresist Developer, 1:3 MIBK:IPA, 4L Bottle

Details

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