KemLab™ HARE-SQ™ 10-100ML Negative High Aspect Ratio Epoxy Photoresist, 10um Film Thickness, 100mL (SAMPLE)
Notice: Hazardous chemicals and products will incur additional Hazmat Fees and/or mandatory shipment via LTL Motor Freight
- KemLab™ HARE-SQ™ negative tone photoresist uses an epoxy resin with superior cleanliness and excellent reproducibility
- Film Thickness: 10 microns. Consistent surface energy of crosslinked resist, (an important property for microfluidic applications.
- Fully compatible with SU-8 processes. KemLab™ HARE-SQ™ negative tone epoxy photoresist is designed for use with KemLab™ SQ developer.
- Softbake for the KemLab™ HARE-SQ™ negative tone photoresist utilizes a two-step bake on a contact hot plate in order to minimize film stress and adhesion issues.
- Competes with SU8 10 Negative Tone Photoresist
- 100mL SAMPLE Bottle
- Manufacturer: KemLab Inc
- Manufacturer Part No: HARESQ10-100ML
Details
KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.
Documents & Videos
KemLab™ HARE-SQ™ is an epoxy based negative photoresist designed for polymeric MEMS, microfluidics, micromachining and other microelectronic applications. The HARE-SQ system is designed for use in thick film applications of 2 to 100 microns, and is ideal for use in permanent applications in which the photoresist remains within the finished device.